SOURCE-LINKED INTELLIGENCE

Mined from Scientific Literature: Process Schemas for Atomic Layer Deposition and Etching in Materials Science

arXiv · AI, language, vision and robotics · article · Sep 10, 2026 · UTC

Atomic layer deposition (ALD) and atomic layer etching (ALE) are reported heterogeneously across experimental and simulation literature in materials science, hindering comparison and machine-actionable reuse. We present four domain-expert-reviewed JSON Schemas for ALD and ALE experimental and simulation processes. Curated with schema-miner and grounded in QUDT using schema-miner pro, the schemas structure materials, process conditions, configurations , and measured or predicted results. We compare their scope, structure, and semantic grounding, and demonstrate their use for schema-guided liter

Read original source ↗ Open in workspace

recordType

paper

region

Global