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Dispersion force masked-based helium atom lithography

CORDIS · observation · Publication date unknown

tal without chips. Leading-edge semiconductors provide the foundation of the digitalization of entire sectors and industries that are transforming the EU economy and of emerging technologies such as artificial intelligence and quantum computing. Photolithography is currently used for the initial patterning step of chip manufacturing and leading-edge chips require smaller and smaller features. The smallest features that can be produced with this technology (26 nm at present and expected to reach 16 nm in 2028) not only limits the performance and power efficiency of leading-edge chips, but also the opening of new markets linked to quantum devices and silicon devices with integrated light sources. FabouLACE project catches this opportunity through a disruptive lithography approach that uses metastable atoms and dispersion force-based masks and enables features of 2 nm. The technology, currently at proof of concept stage and protected by two patents, will be brought at TRL 6 by the end of the project by developing a prototype. Its performances will be validated together with Imec (ke

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recordType

award

status

SIGNED

region

EU

value

2499397

unit

EUR